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عنوان فارسی مقاله:
پردازش دمای پایین پلاسما برای ساخت غشاهای نازک رشد سلول کربن دمیده
عنوان انگلیسی مقاله:
Low temperature plasma processing for cell growth inspired carbon thin films fabrication
سال انتشار : 2016
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مقدمه انگلیسی مقاله:
1. Introduction
Carbon thin films offer a wide range of exceptional physical, mechanical, biomedical and tribological properties that makes them scientifically fascinating and commercially essential for numerous industrial applications. Conventionally, carbon films have two structural extremes; the hard diamond-like phase with sp3 bonds and the softer graphite-like phase with sp2 bonds. The phases with majority of sp3 bonds percentages; the diamond (100%), nc-diamond (>90%), and diamond-like carbon (80e90%) are preferred as protective coatings, as micro-electromechanical devices, as nanomechanical-based sensors and actuators [1e3]. Whereas, the films with majority of sp2 bonds are found suitable for electrochemical, supercapacitors, sensors or fuel cells applications [4e6]. It has been reported that carbon electrodes can possess a high loading of electrochemically active dopants for excellent supercapacitors performance [4]. As an organic electrode, its superiority to Pt based electrodes has been shown for next generation neural interfaces [5]. Owing to the tailored microstructures and surface area, carbon films were also applied in photovoltaics [7], gas separation [8] and bio-applications [9e12]. Particularly for bioapplications, the interesting electrochemical properties of carbon have found large potential window for water splitting reactions, enhancing its selectivity for bio-molecule sensing. Apart this, introduction of chemical functionalities has also been reported for cell-proliferation [12]. Conventionally diamond-like carbon was used for cell-cultivation applications [10,11]. But higher processing temperature for diamond-like carbon restricts its use on flexible substrate. This demands the need of identifying other forms of carbon or the processing advances which can be suitable for the cell-growth inspired carbon films. Nanocrystalline carbon (nc-C), which has coexisting threefold (sp2 bonding) and fourfold (sp3 ) bonding coordination, can be an interesting choice in this direction. Though the sp3 and sp2 bonds have short range order only, the bonds casually can intermix and exhibit extended order on nanoscale [13]. By adjusting the ratio of sp2 to sp3 bonds in the deposited films, one can obtain the desired functional properties of the films. However, the correlation of carbon hybridizations is sparsely studied in relation to bio-applications. Varieties of synthesis techniques i.e. photocatalytic process [14], chemical vapour deposition [8,15], magnetron sputtering [12,16e18] etc. are reported for the deposition of carbon films. Considering the industrial needs (i.e. purity, fast process, environmental safety and simple processing steps), sputtering based techniques are preferred over others. Using RF sputtering process (having ion energies in the range of 50e120 eV) nucleation of ncgraphite/diamond clusters is reported to be initiated at temperature in the range of 23e93 C [16]. However, most of the DCsputtering induced films usually remain amorphous unless processing is not supplemented with additional physical energy (substrate temperature, post deposition annealing, substrate bias etc.). Evolution of nc-C by aggregation of sp2 clusters was suggested in the presence of relatively high pressures [1], but recent report, on the effect of working pressure enhancement, showed the porosity enhancement in the films [19]. From, post deposition annealing point of view, crystallization of amorphous-C, in inert atmosphere, usually starts at temperature higher than 800 C. Annealing in atmospheric conditions had shown the transition temperature as low as 200 C, where catalytic effect of oxygen initiated the nucleation process [20]. It should be mentioned here that catalytic action turns the film structure as porous, hence it should be avoided if the objective is to find a stable dense coating. Considering these reports and the underlying limitations, we hypothesized that enhancing the ionization of neutral species and kinetic energy of ions/neutrals during the sputtering process can be suitable for preparation of ncC films. For investigating our hypothesis, we employed addition of pulse frequencies on high power density. We present here the methodology to deposit good quality unhydrogenated nc-C thin films at low temperatures (without the requirements of any substrate temperature or biasing). The roles of power density and pulse frequency on the film growth, surface energy and chemical bonding of deposited thin films have been presented in details. Finally, the cell viability of mouse fibroblast L- 929 and Saos-2 bone cells on the deposited films has been demonstrated.
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کلمات کلیدی:
Low temperature plasma processing for cell growth inspired carbon ... isi-dl.com/item/83102 Low temperature plasma processing for cell growth inspired carbon thin films fabrication. sciencedirect.com. Source Link ... Carbon microelectromechanical systems as a substratum for cell ... iopscience.iop.org/article/10.1088/1748-6041/3/3/034116/meta by GT Teixidor - 2008 - Cited by 56 - Related articles Aug 15, 2008 - Both cell lines showed preferential adhesion to the selectively .... Low Temperature Plasma Processing for Cell Growth Inspired Carbon Thin ... Surface Energy in Nanocrystalline Carbon Thin Films: Effect of Size ... pubs.acs.org/doi/pdf/10.1021/acs.langmuir.6b04463 by M Kumar - 2017 Keywords: surface energy; stability; carbon; neutral dominant process; size ...... temperature plasma processing for cell growth inspired carbon thin films ... Surface Energy in Nanocrystalline Carbon Thin ... - ACS Publications pubs.acs.org/doi/full/10.1021/acs.langmuir.6b04463 by M Kumar - 2017 Feb 16, 2017 - The advanced plasma process induced the dominant deposition of ...... temperature plasma processing for cell growth inspired carbon thin films ... 2016|Hori-Sekine-Lab - 堀・関根研究室 - 名古屋大学 horilab.nuee.nagoya-u.ac.jp/index.php?id=652 Helium-based cold atmospheric plasma-induced reactive oxygen ... Low temperature plasma processing for cell growth inspired carbon thin films fabrication Manish Kumar (0000-0002-0141-5318) - ORCID | Connecting ... https://orcid.org/0000-0002-0141-5318 2014, he joined Centre for Advance Plasma Surface Technology (CAPST), .... Low temperature plasma processing for cell growth inspired carbon thin films ... Low temperature plasma processing for cell grow... - Scoop.it www.scoop.it/.../low-temperature-plasma-processing-for-cell-growth-inspired-carbon-thi... Oct 6, 2016 - Low temperature plasma processing for cell growth inspired carbon thin films fabrication. - PubMed - NCBI · Low temperature plasma ...
